PESM 2022 is the 12th event in a series devoted to plasma etch and strip processes for micro-, nano- and bio-technologies.
This workshop will be held in September 2022 in Leuven (Belgium) and will be embedded in the MNE 2022 conference.  
The objective of the workshop is to provide a forum for open discussions between science and technology. It is not only dedicated to scientists, process engineers and Ph-D students, but also to industrial partners in the field of dry etching, including plasma processing but also other vacuum-based removal techniques (ion beam, neutral beam, gaseous thermal etching, etc...).
Topics may include both fundamental and applied research highlights, as well as issues related to the introduction of new technologies into manufacturing.
Among other topics, PESM 2022 will focus on etching and strip challenges of III-V materials, advanced memory stacks, and more than Moore applications. It will also focus on emerging plasma etching concepts and technologies. To stimulate technical discussions, invited talks will be given by scientific and technical leaders of the etch community, in each of the key areas defined above.

The PESM workshop is co-organized by imec v.z.w., the CEA-Leti and the CNRS (LTM lab, GREMI).

  • Session 1: Plasma etching processes for III-V semiconductor materials - CMOS, power, LED, solar cells,..
    • Invited talk: Dr Markus Heyne, AMS-OSRAM (Regensburg, GER)
  • Session 2: Plasma etching processes for advanced memory technologies - OXRAM, PCRAM, MRAM,..
    • Invited talk: Dr Ricardo Sousa, SPINTECH (Grenoble, FR)
  • Session 3: Plasma processes for more than Moore applications - MEMS, NEMS, Imagers, Photonics, ..
    • Invited talk: Dr Thomas Tillocher, GREMI (OrlĂ©ans, FR)
  • Session 4: Emerging plasma etching concept and technology - Alternative lithography, ALE, TSD,..
    • Keynote speaker: Dr Thorsten Lill, Lam Research (Fremont, CA, USA)

We are happy to announce that the PESM 2022 Best Student Oral Presentation award has been attributed to Mr Jakub Dranczewski (IBM Research Europe - Zurich) for his talk entitled

Top-down fabrication of complex nanophotonic lasers from bonded III-V semiconductor layers

link to presentation

JakubDranczewski LRJakub Dranczewski, IBM Research Europe - Zurich

The award was supported by Tokyo Electron Ltd.

TEL withoutTM rgb

The PESM 2022 organizing committee is composed of T. Chevolleau (CEA/Leti), J.-F. de Marneffe (imec v.z.w.), R. Dussart (GREMI), A. Milenin (imec v.z.w.), E. Pargon (CNRS-LTM), C. Petit-Etienne (CNRS-LTM) and N. Posseme (CEA-Leti).

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